Federica Allegretti

is working from home. 🏡

Bis 2022, Project Manager - Senior Principal Engineer R&D, ams-OSRAM International GmbH

Bad Ragaz, Schweiz

Fähigkeiten und Kenntnisse

oxide etch
GaAs etch
CVD
thin film deposition
development of new processes
metal etch
metal evaporation
Project Management
wafer level optics
Anti-reflective coating
Project Controlling

Werdegang

Berufserfahrung von Federica Allegretti

  • Bis heute 1 Jahr und 6 Monate, seit Jan. 2023

    Project Manager

    working from home

  • Bis heute 8 Jahre und 9 Monate, seit Okt. 2015

    Senior Process Engineer Thin Films

    II-VI Laser Enterprise GmbH

    Senior Process Engineer Thin Film for CVD, ALD of dielectrics, Metal Evaporation and Sputtering

  • 2 Jahre und 6 Monate, Juli 2020 - Dez. 2022

    Project Manager - Senior Principal Engineer R&D

    ams-OSRAM International GmbH

    optoelectronics, VCSEL, edge emitting lasers, wafer level optics, optics, optical coatings, antireflective coatings, PECVD, ALD, metal contacts, evaporation, oxide etch

  • 6 Jahre und 9 Monate, Jan. 2009 - Sep. 2015

    Development engineer

    Oerlikon Solar

    Equipment engineer for PECVD of Silicon on glass for the production of thin film solar panels.

  • 1 Jahr und 7 Monate, Juni 2007 - Dez. 2008

    Etch Process Engineer

    Qimonda

    Process Engineer for Oxide Etch. Highly scientific approach to technical problems. Very strong ability in development of new processes. Experience with metal CVD, MBE of III-V thin films and bulk crystal growth.

  • 9 Jahre und 5 Monate, Jan. 1998 - Mai 2007

    Process Supervisor

    Tokoyo Electron Europe

    Process engineer for metal CVD, Low-k spin-on deposition and oxide etch.

Ausbildung von Federica Allegretti

  • 1995 - 1998

    Molecular Beam Epitaxy

    Imperial College London

    Selective growth on SiO2 masks VCSELs device growth Elemental growth mechanism on vicinal (011) surfaces

  • 1993 - 1995

    Molecular Beam Epitaxy

    University of Tokyo

    Elemental growth mechanism of GaAs Selective growth on SiO2 substrates

  • 1980 - 1986

    Chemistry

    Universita' di Milano

    Solid State Physics Semiconductor Technology Material Science Surface Physics

Sprachen

  • Italienisch

    Muttersprache

  • Englisch

    Fließend

  • Französisch

    Gut

  • Deutsch

    Fließend

  • Japanisch

    Grundlagen

Interessen

semiconductor physics
IC technology
photography

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