Shyamal Mondal

Ion implantation, recrystallization using RTA of irradiated of semiconductor thin films for sensing and energy applications like TE and LIB application.• Characterization using scanning electron microscope, EDS, AFM, XPS• Nano and micro-fabrications using electron beam lithography, state of the art LMAIS focused ion beam with Au/Si ions and clean room usage for the gas sensing device fabrication. • Simulating FIB milling depth, contamination profile using TRIDYN. • Reporting and drafting manuscripts.

Thesis title: Formation and Deposition of Size-Selected Metal Nanoclusters Using a Magnetron Based Source • Maintenance of ultra-high vacuum (UHV) equipment (NanoDep60, OAR, UK) and Deposition of nanoclusters using magnetron based source • Ion irradiation of semiconductor surfaces (<1 keV to 30 keV) • Electron microscopy imaging (SEM, TEM) and spectroscopy (CL, EDXS, EBSD) • Chemical analysis using XPS • TEM sample preparation • Writing manuscripts for journals and presenting at conferences

Specialization: X-ray and crystallography. Project: Study of second order autonomous and non-autonomous system. A three-month project involving c-programing to solve a non-linear differential equation and finding the chaos vortices. It was found that value of the constants determine whether vortices will be formed not. Supervisor: Prof. Bishnu Charan Biswas