Dipl.-Ing. Stefan Hempel

- Responsibility for Industrial Engineering topics of different semiconductor manufacturing modules - member of global equipment excellence team to improve top company bottleneck tools - worldwide projectlead for several productivity improvement projects (USA, Singapure) - project lead "IEE1CLICK" - automated Gantt-Chart analyses and root cause detection system - taskforce driver for midterm capacity optimization of lithography clusters - future tool specifications to support company production ramp

- module IE for lithography equipments including linked track/scanner clusters ArF, ArFimm, KrF - provide data analysis results in clear summarized charts for management - close collaboration with module management to prioritize next productivity improvement projects - part of interview team to build up a new IE team - project management for development of companywide IE throughput & capacity planning database

- OEE tool analysis and optimization - definition and deep dive analysis on capacity planning parameters/topics - creation of short- and midterm automated capacity planing models for different tool types - dedication model development for capacity balancing and simulation of lithography clusters - project lead "Litho throughput indicator" includes concept creation, development and realization of throughput loss model for track/scanner linked clusters

Produktionstechnik; Produktionslogistik und -optimierung; Fabrikplanung